Published January 22, 2024 | Version v1
Dataset Open

Shipping contribution to European air quality and depositions, both in 2018 and in two future scenarios for 2050, modelled by SILAM CTM

Description

Emissions from ships are one important source of pollutants that effect both the air and water quality. Here the 2018 European air quality is modelled using the System for Integrated modeLling of Atmospheric coMposition (SILAM) chemistry transport model, together with Ship Traffic Assessment Model (STEAM). Annual mean surface concentrations and depositions of various species are calculated for the year 2018, both with and without shipping emissions in European scale at a resolution of 0.05 degrees. Additionally, the air quality and deposition fields were modelled by using the two shipping emission scenarios for the year 2050. The shipping emission for the year 2018 and for the future scenarios S3 and S8 were specifically build for the EU Horizon project EMERGE.

Methods

The dispersion of different air pollutants and other related species is followed by using System for Integrated modeLling of Atmospheric coMposition (SILAM) chemistry transport model version 5.8 (http://silam.fmi.fi, open-source code http://github.com/fmidev/silam-model). For standard air pollutants the model uses CAMS regional emissions inventory version 4.2, while the year 2018 shipping emissions are replaced by the most recent hourly STEAM emission fields generated for the EMERGE project. The model is driven by ECMWF's high resolution (0.1 x 0.1 degrees) hourly operational weather forecast that is based on the Integrated Forecasting System (IFS). The SILAM dispersion model is run both with and without the 2018 shipping emissions. Additionally, the model is also run using the two future shipping emissions scenarios for 2050. These scenarios not only estimate the growth of the shipping sector, but also take into account the developments in exhaust gas cleaning systems (known as scrubbers) and use of alternative fuels. The description of these scenarios can be found, e.g., in https://doi.org/10.35614/isbn.9789523361898. Both future scenarios, S3 and S8, are first run using the land emissions for 2018. Secondly, the future state is modelled using the scaled land emissions for 2050 (based on ECLIPSE Maximum Feasible Reduction scenario), and running the model without shipping emissions, and with the same two scenario emissions (S3 and S8) for shipping. In all runs the meteorological driver is for the year 2018. The yearly averaged output is in 0.05 x 0.05 degree resolution and contains the surface concentrations, wet and dry depositions, together with optical depths of all SILAM tropospheric species. The chemistry is based on the CBM05 model with secondary organic aerosols. Additionally, the model includes sea-salt and desert-dust.

Table of contents

The dataset contains 7 different netCDF files from 7 model runs, all containing the same set of species, with the exception that the runs without shipping do not have ash originating from ships. The files are related to following setups: * SILAM-NO-SHIP-2018LandEmis-2018YearMean.nc4: Model run with CAMS-REG-4.2 regional emissions for 2018 and without shipping emissions. * SILAM-NO-SHIP-2050LandEmis-2018YearMean.nc4: Model run with CAMS-REG-4.2 regional emissions scaled to estimate the 2050 land-emissions, and without shipping emissions. * SILAM-SCEN3-SHIP-2018LandEmis-2018YearMean.nc4: Model run with CAMS-REG-4.2 regional emissions for 2018, together with 2050 STEAM S3 scenario emissions for shipping. * SILAM-SCEN3-SHIP-2050LandEmis-2018YearMean.nc4: Model run with CAMS-REG-4.2 regional emissions scaled to estimate the 2050 land-emissions, together with 2050 STEAM S3 scenario emissions for shipping. * SILAM-SCEN8-SHIP-2018LandEmis-2018YearMean.nc4: Model run with CAMS-REG-4.2 regional emissions for 2018, together with 2050 STEAM S8 scenario emissions for shipping. * SILAM-SCEN8-SHIP-2050LandEmis-2018YearMean.nc4: Model run with CAMS-REG-4.2 regional emissions scaled to estimate the 2050 land-emissions, together with 2050 STEAM S8 scenario emissions for shipping. * SILAM-STEAM-SHIP-2018LandEmis-2018YearMean.nc4: Model run with CAMS-REG-4.2 regional emissions for 2018, together with STEAM emissions for shipping (base-run). Note that the land based emissions for Lead and Cadmium, that were taken from EMEP emission inventory, are always kept in their 2018 levels, also in runs that are based on the 2050 land emissions of standard air pollutants.

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Additional details

Identifiers

Funding

European Union H2020
EMERGE 874990

Instruments

System for Integrated modeLling of Atmopsheric coMposition SILAM
undefined (Other)

FMI metadata

Model
System for Integrated modeLling of Atmopsheric coMposition SILAM
Parameter
  • Parameter name: cnc_AACD_gas, dd_AACD_gas, wd_AACD_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of acetic acid (CH3COOH)
  • Parameter name: cnc_ALD2_gas, dd_ALD2_gas, wd_ALD2_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of acetaldehyde (CH3CHO)
  • Parameter name: cnc_ALDX_gas, dd_ALDX_gas, wd_ALDX_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of propionaldehyde (C2H5CHO) and higher aldehydes
  • Parameter name: cnc_AVB0_gas, dd_AVB0_gas, wd_AVB0_gas
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of the gaseous anthropogenic volatile organics of lowest volatility (bin -1)
  • Parameter name: cnc_AVB0_m_50, dd_AVB0_m_50, wd_AVB0_m_50, ocd_AVB0_m_50_w380, ocd_AVB0_m_50_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for aerosol mode anthropogenic volatile organics of lowest volatility (bin -1)
  • Parameter name: cnc_AVB1e0_gas, dd_AVB1e0_gas, wd_AVB1e0_gas
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of the gaseous anthropogenic volatile organics in volatility bin 0
  • Parameter name: cnc_AVB1e0_m_50, dd_AVB1e0_m_50, wd_AVB1e0_m_50, ocd_AVB1e0_m_50_w380, ocd_AVB1e0_m_50_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for aerosol mode anthropogenic volatile organics in volatility bin 0
  • Parameter name: cnc_AVB1e1_gas, dd_AVB1e1_gas, wd_AVB1e1_gas
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of the gaseous anthropogenic volatile organics in volatility bin 1
  • Parameter name: cnc_AVB1e1_m_50, dd_AVB1e1_m_50, wd_AVB1e1_m_50, ocd_AVB1e1_m_50_w380, ocd_AVB1e1_m_50_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for aerosol mode anthropogenic volatile organics in volatility bin 1
  • Parameter name: cnc_AVB1e2_gas, dd_AVB1e2_gas, wd_AVB1e2_gas
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of the gaseous anthropogenic volatile organics in volatility bin 2
  • Parameter name: cnc_AVB1e2_m_50, dd_AVB1e2_m_50, wd_AVB1e2_m_50, ocd_AVB1e2_m_50_w380, ocd_AVB1e2_m_50_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for aerosol mode anthropogenic volatile organics in volatility bin 2
  • Parameter name: cnc_AVB1e3_gas, dd_AVB1e3_gas, wd_AVB1e3_gas
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of the gaseous anthropogenic volatile organics in volatility bin 3
  • Parameter name: cnc_AVB1e3_m_50, dd_AVB1e3_m_50, wd_AVB1e3_m_50, ocd_AVB1e3_m_50_w380, ocd_AVB1e3_m_50_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for aerosol mode anthropogenic volatile organics in volatility bin 3
  • Parameter name: cnc_AVB1e4_gas, dd_AVB1e4_gas, wd_AVB1e4_gas
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of the gaseous anthropogenic volatile organics in volatility bin 4
  • Parameter name: cnc_AVB1e5_gas, dd_AVB1e5_gas, wd_AVB1e5_gas
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of the gaseous anthropogenic volatile organics in volatility bin 5
  • Parameter name: cnc_AVB1e6_gas, dd_AVB1e6_gas, wd_AVB1e6_gas
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of the gaseous anthropogenic volatile organics in volatility bin 6
  • Parameter name: cnc_BENZENE_gas, dd_BENZENE_gas, wd_BENZENE_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of benzene (C6H6)
  • Parameter name: cnc_BVB0_gas, dd_BVB0_gas, wd_BVB0_gas
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of the gaseous biogenic volatile organics of lowest volatility (bin -1)
  • Parameter name: cnc_BVB0_m_50, dd_BVB0_m_50, wd_BVB0_m_50, ocd_BVB0_m_50_w380, ocd_BVB0_m_50_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for aerosol mode biogenic volatile organics of lowest volatility (bin -1)
  • Parameter name: cnc_BVB1e0_gas, dd_BVB1e0_gas, wd_BVB1e0_gas
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of the gaseous biogenic volatile organics of in volatility bin 0
  • Parameter name: cnc_BVB1e0_m_50, dd_BVB1e0_m_50, wd_BVB1e0_m_50, ocd_BVB1e0_m_50_w380, ocd_BVB1e0_m_50_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for aerosol mode biogenic volatile organics in volatility bin 0
  • Parameter name: cnc_BVB1e1_gas, dd_BVB1e1_gas, wd_BVB1e1_gas
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of the gaseous biogenic volatile organics of in volatility bin 1
  • Parameter name: cnc_BVB1e1_m_50, dd_BVB1e1_m_50, wd_BVB1e1_m_50, ocd_BVB1e1_m_50_w380, ocd_BVB1e1_m_50_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for aerosol mode biogenic volatile organics in volatility bin 1
  • Parameter name: cnc_BVB1e2_gas, dd_BVB1e2_gas, wd_BVB1e2_gas
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of the gaseous biogenic volatile organics of in volatility bin 2
  • Parameter name: cnc_BVB1e2_m_50, dd_BVB1e2_m_50, wd_BVB1e2_m_50, ocd_BVB1e2_m_50_w380, ocd_BVB1e2_m_50_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for aerosol mode biogenic volatile organics in volatility bin 2
  • Parameter name: cnc_BVB1e3_gas, dd_BVB1e3_gas, wd_BVB1e3_gas
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of the gaseous biogenic volatile organics of in volatility bin 2
  • Parameter name: cnc_BVB1e3_m_50, dd_BVB1e3_m_50, wd_BVB1e3_m_50, ocd_BVB1e3_m_50_w380, ocd_BVB1e3_m_50_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for aerosol mode biogenic volatile organics in volatility bin 3
  • Parameter name: cnc_C2O3_gas, dd_C2O3_gas, wd_C2O3_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of peroxyacetyl radical CH3C(O)OO
  • Parameter name: cnc_C5H8_2_gas, dd_C5H8_2_gas, wd_C5H8_2_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of monoterpenes
  • Parameter name: cnc_C5H8_gas, dd_C5H8_gas, wd_C5H8_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of isoprene
  • Parameter name: cnc_CO_gas, dd_CO_gas, wd_CO_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of carbon monoxide
  • Parameter name: cnc_CRES_gas, dd_CRES_gas, wd_CRES_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Cresol and higher molecular weight phenols
  • Parameter name: cnc_CRO_gas, dd_CRO_gas, wd_CRO_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Methylphenoxy radical
  • Parameter name: cnc_CXO3_gas, dd_CXO3_gas, wd_CXO3_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of C3 and higher acylperoxy radicals (as in CBM05 chemistry)
  • Parameter name: cnc_Cd_m_30, dd_Cd_m_30, wd_Cd_m_30, ocd_Cd_m_30_w380, ocd_Cd_m_30_w550
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for aerosol mode Cadmium with nominal diameter 0.3um
  • Parameter name: cnc_EC_m_50, wd_EC_m_50, wd_EC_m_50, ocd_EC_m_50_w380, ocd_EC_m_50_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for Elemental Carbon with nominal diameter 0.5um
  • Parameter name: cnc_ETHA_gas, dd_ETHA_gas, wd_ETHA_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Ethane
  • Parameter name: cnc_ETH_gas, dd_ETH_gas, wd_ETH_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Ethene
  • Parameter name: cnc_ETOH_gas, dd_ETOH_gas, wd_ETOH_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Ethanol
  • Parameter name: cnc_FACD_gas, dd_FACD_gas, wd_FACD_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Formic acid
  • Parameter name: cnc_H2O2_gas, dd_H2O2_gas, wd_H2O2_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Hydrogen peroxide
  • Parameter name: cnc_HCHO_gas, dd_HCHO_gas, wd_HCHO_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Formaldehyde
  • Parameter name: cnc_HCO3_gas, dd_HCO3_gas, wd_HCO3_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of bicarbonate ion
  • Parameter name: cnc_HNO3_gas, dd_HNO3_gas, wd_HNO3_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Nitric acid
  • Parameter name: cnc_HO2_gas, dd_HO2_gas, wd_HO2_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Hydroperoxy radical
  • Parameter name: cnc_HONO_gas, dd_HONO_gas, wd_HONO_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Nitrous acid
  • Parameter name: cnc_IOLE_gas, dd_IOLE_gas, wd_IOLE_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Internal olefin carbon bond (as in CBM05 chemistry)
  • Parameter name: cnc_ISPD_gas, dd_ISPD_gas, wd_ISPD_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Isoprene product (as in CBM05 chemistry)
  • Parameter name: cnc_MEO2_gas, dd_MEO2_gas, wd_MEO2_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Methylperoxy radical
  • Parameter name: cnc_MEOH_gas, dd_MEOH_gas, wd_MEOH_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Methanol
  • Parameter name: cnc_MEPX_gas, dd_MEPX_gas, wd_MEPX_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Methylhydroperoxide
  • Parameter name: cnc_MGLY_gas, dd_MGLY_gas, wd_MGLY_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Methylglyoxal and other aromatic products
  • Parameter name: cnc_N2O5_gas, dd_N2O5_gas, wd_N2O5_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Dinitrogen pentoxide
  • Parameter name: cnc_NH3_gas, dd_NH3_gas, wd_NH3_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Ammonia
  • Parameter name: cnc_NH415SO4_m_20, dd_NH415SO4_m_20, wd_NH415SO4_m_20, ocd_NH415SO4_m_20_w380, ocd_NH415SO4_m_20_w550
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for Ammonium sulphate with nominal diameter 0.2um
  • Parameter name: cnc_NH415SO4_m_70, dd_NH415SO4_m_70, wd_NH415SO4_m_70, ocd_NH415SO4_m_70_w380, ocd_NH415SO4_m_70_w550
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for Ammonium sulphate with nominal diameter 0.7um
  • Parameter name: cnc_NH4NO3_m_70, dd_NH4NO3_m_70, wd_NH4NO3_m_70, ocd_NH4NO3_m_70_w380, ocd_NH4NO3_m_70_w550
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for Ammonium nitrate with nominal diameter 0.7um
  • Parameter name: cnc_NO2_gas, dd_NO2_gas, wd_NO2_gas, ocd_NO2_gas_w380, ocd_NO2_gas_w550
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for Nitrogen dioxide
  • Parameter name: cnc_NO3_c_m3_0, dd_NO3_c_m3_0, wd_NO3_c_m3_0, ocd_NO3_c_m3_0_w380, ocd_NO3_c_m3_0_w550
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for coarse nitrate with nominal diameter 3um
  • Parameter name: cnc_NO3_gas, dd_NO3_gas, wd_NO3_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Nitrate radical
  • Parameter name: cnc_NO_gas, dd_NO_gas, wd_NO_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Nitric oxide
  • Parameter name: cnc_NTR_gas, dd_NTR_gas, wd_NTR_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of organic nitrate
  • Parameter name: cnc_O1D_gas, dd_O1D_gas, wd_O1D_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Oxygen atom in the O1(D) state
  • Parameter name: cnc_O3_gas, dd_O3_gas, wd_O3_gas, ocd_O3_gas_w380, ocd_O3_gas_w550
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for Ozone
  • Parameter name: cnc_OH_gas, dd_OH_gas, wd_OH_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Hydroxyl radical
  • Parameter name: cnc_OLE5_gas, dd_OLE5_gas, wd_OLE5_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Terminal olefin carbon bond (as in CBM05 chemistry)
  • Parameter name: cnc_OPEN_gas, dd_OPEN_gas, wd_OPEN_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Aromatic ring opening product
  • Parameter name: cnc_O_gas, dd_O_gas, wd_O_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Oxygen atom in the O3(P) state.
  • Parameter name: cnc_PACD_gas, dd_PACD_gas, wd_PACD_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Peroxyacetic and higher peroxycarboxylic acids
  • Parameter name: cnc_PANX_gas, dd_PANX_gas, wd_PANX_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of C3 and higher peroxyacyl nitrates
  • Parameter name: cnc_PAN_gas, dd_PAN_gas, wd_PAN_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Peroxyacetyl nitrate
  • Parameter name: cnc_PAR5_gas, dd_PAR5_gas, wd_PAR5_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Paraffin carbon bond (as in CBM05 chemistry)
  • Parameter name: cnc_PM_GFAS_m_50, dd_PM_GFAS_m_50, wd_PM_GFAS_m_50, ocd_PM_GFAS_m_50_w380, ocd_PM_GFAS_m_50_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for fire originated PM2.5 with nominal diameter 0.5um
  • Parameter name: cnc_PM_m6_0, dd_PM_m6_0, wd_PM_m6_0, ocd_PM_m6_0_w380, ocd_PM_m6_0_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for coarse PM with nominal diameter 0.5um
  • Parameter name: cnc_PNA_gas, dd_PNA_gas, wd_PNA_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Peroxynitric acid
  • Parameter name: cnc_Pb_m_30, dd_Pb_m_30, wd_Pb_m_30, ocd_Pb_m_30_w380, ocd_Pb_m_30_w550
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for aerosol mode Lead with nominal diameter 0.3um
  • Parameter name: cnc_ROOH_gas, dd_ROOH_gas, wd_ROOH_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Higher organic peroxide
  • Parameter name: cnc_ROR5_gas, dd_ROR5_gas, wd_ROR5_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Secondary alkoxy radical
  • Parameter name: cnc_SESQ_gas, dd_SESQ_gas, wd_SESQ_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Sesquiterpenes
  • Parameter name: cnc_SO2_gas, dd_SO2_gas, wd_SO2_gas, ocd_SO2_gas_w380
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 nm for Sulphur dioxide
  • Parameter name: cnc_SO4_m_20, dd_SO4_m_20, wd_SO4_m_20, ocd_SO4_m_20_w380, ocd_SO4_m_20_w550
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for aerosol mode sulphates with nominal diameter 0.2um
  • Parameter name: cnc_SO4_m_70, dd_SO4_m_70, wd_SO4_m_70, ocd_SO4_m_70_w380, ocd_SO4_m_70_w550
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for aerosol mode sulphates with nominal diameter 0.7um
  • Parameter name: cnc_TO2_gas, dd_TO2_gas, wd_TO2_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Toluene-hydroxyl radical adduct (as in CBM05 chemistry)
  • Parameter name: cnc_TOL_gas, dd_TOL_gas, wd_TOL_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Toluene and other monoalkyl aromatics (as in CBM05 chemistry)
  • Parameter name: dd_XO2N_gascnc_XO2N_gas, wd_XO2N_gas,
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of NO to organic nitrate conversion (operator) from alkylperoxy (RO2) radical (as in CBM05 chemistry)
  • Parameter name: cnc_XO2_gas, dd_XO2_gas, wd_XO2_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of NO to NO2 conversion (operator) from alkylperoxy (RO2) radical (as in CBM05 chemistry)
  • Parameter name: cnc_XYL_gas, dd_XYL_gas, wd_XYL_gas
  • Parameter unit: mole/m3 (for cnc), mole/m2/s (for dd and wd)
  • Parameter description: concentration (cnc), dry deposition (dd), and wet deposition (wd) of Xylene and other polyalkyl aromatics (as in CBM05 chemistry)
  • Parameter name: cnc_ash_m_30, dd_ash_m_30, wd_ash_m_30, ocd_ash_m_30_w380, ocd_ash_m_30_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for ash (from ships) with nominal diameter 0.3um
  • Parameter name: cnc_dust_m1_5, dd_dust_m1_5, wd_dust_m1_5, ocd_dust_m1_5_w380, ocd_dust_m1_5_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for desert-dust with nominal diameter 1.5um
  • Parameter name: cnc_dust_m20, dd_dust_m20, wd_dust_m20, ocd_dust_m20_w380, ocd_dust_m20_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for desert-dust with nominal diameter 20um
  • Parameter name: cnc_dust_m6_0, dd_dust_m6_0, wd_dust_m6_0, ocd_dust_m6_0_w380, ocd_dust_m6_0_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for desert-dust with nominal diameter 6um
  • Parameter name: cnc_dust_m_30, dd_dust_m_30, wd_dust_m_30, ocd_dust_m_30_w380, ocd_dust_m_30_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for desert-dust with nominal diameter 0.3um
  • Parameter name: cnc_mineral_m_50, dd_mineral_m_50, wd_mineral_m_50, ocd_mineral_m_50_w380, ocd_mineral_m_50_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for mineral fine with nominal diameter 0.5um
  • Parameter name: cnc_sslt_m20, dd_sslt_m20, wd_sslt_m20, ocd_sslt_m20_w380, ocd_sslt_m20_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for sea-salt with nominal diameter 20um
  • URL:
  • Parameter name: cnc_sslt_m3_0, dd_sslt_m3_0, wd_sslt_m3_0, ocd_sslt_m3_0_w380, ocd_sslt_m3_0_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for sea-salt with nominal diameter 3um
  • Parameter name: cnc_sslt_m9_0, dd_sslt_m9_0, wd_sslt_m9_0, ocd_sslt_m9_0_w380, ocd_sslt_m9_0_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for sea-salt with nominal diameter 9um
  • Parameter name: cnc_sslt_m_05, dd_sslt_m_05, wd_sslt_m_05, ocd_sslt_m_05_w380, ocd_sslt_m_05_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for sea-salt with nominal diameter 0.05um
  • Parameter name: cnc_sslt_m_50, dd_sslt_m_50, wd_sslt_m_50, ocd_sslt_m_50_w380, ocd_sslt_m_50_w550
  • Parameter unit: kg/m3 (for cnc), kg/m2/s (for dd and wd), unitless (for ocd)
  • Parameter description: concentration (cnc), dry deposition (dd), wet deposition (wd), and optical column depth (ocd) at wavelenght of 380 and 550nm for sea-salt with nominal diameter 0.5um
Data levels (meter, hectoPascal, degree, sigma pressure levels, other) in vertical direction(+/-) for example 1500 m or 850 hPa
  • Level: surface level
Resolution
5
Resolution unit
km
Topic category
environment

Temporal Coverage

Ranges:

Start date: 2017-12-31
End date: 2018-12-31

Locations

Europe (0.05 x 0.05 degree resolution) Envelope: